Your First Thin-Film Design: From Bare Glass to Broadband AR
This tutorial starts from the reflectance baseline of bare glass, estimates a single 550 nm antireflection layer, and then expands the target to a 450–650 nm broadband coating. You will build a four-layer stack and check it with reflectance and energy conservation.
| Design stage | Stack size | Validation quantity |
|---|---|---|
| Bare glass | 0 layers | Establish the surface-reflection baseline |
| Single-layer AR | 1 layer | Substantially reduce reflectance at 550 nm |
| Broadband AR | 4 layers | Keep average reflectance below 0.1% over 450–650 nm |
The Bare-Glass Baseline
For normal incidence from air onto glass, the single-interface reflectance is
Here, is power reflectance, is the refractive index of air, and is the refractive index of glass. Substituting and gives . In a lossless model, all remaining energy is transmitted, so and .
This baseline matters: every later improvement must be compared with bare glass under the same incident medium, substrate, and wavelength range.
A Single Quarter-Wave AR Layer
At the design wavelength, one round trip through the film introduces a half-wave phase difference, allowing the two main reflected waves to cancel. The physical quarter-wave thickness is
Here, is the physical film thickness, is the vacuum design wavelength, and is the film refractive index. With and , the MgF₂ thickness is .
Perfect single-layer cancellation also requires . MgF₂ has a higher index, so the simulation gives 1.260% reflectance at 550 nm instead of exactly zero. The quarter-wave thickness matches phase; the material index determines whether the amplitudes of the two reflected waves can also match.
Extend the Target to 450–650 nm
Broadband AR must suppress a range, not just one wavelength. Start from a simple four-layer structure and let the optimizer adjust its thicknesses within finite bounds. The stack is listed from the incident side toward the glass substrate.
| Layer | Material | Initial thickness | Allowed range | Optimized thickness |
|---|---|---|---|---|
| 1 | MgF₂ | 99.64 nm | 85–115 nm | 97.373 nm |
| 2 | TiO₂ | 112.24 nm | 95–135 nm | 116.149 nm |
| 3 | MgF₂ | 24.91 nm | 15–40 nm | 37.769 nm |
| 4 | TiO₂ | 14.03 nm | 5–25 nm | 11.108 nm |
| Substrate | Glass | 1 mm, incoherent | Fixed | Fixed |
Enter the optimized thicknesses in the Structure page. Set the glass substrate to incoherent and use the same index of 1.52 for the bottom medium so that the millimeter-scale substrate is not treated as a coherent thin film.

In Optics, set 400–700 nm with a 1 nm step, 0° incidence, unpolarized light, and enable Reflectance and Transmittance. The wider calculation range shows behavior inside and outside the design band; the optimization objective itself uses only 450–650 nm.

Set the Optimization Objective and Variables
Add one objective in Optimizer: minimize average Reflectance from 450 to 650 nm with a 5 nm step, at 0° with unpolarized light. Make all four thicknesses variables using the bounds in the table. Bounds limit the search and prevent the optimizer from hiding a poor starting structure behind extreme thicknesses.

Choose Nelder–Mead with 400 maximum evaluations and an initial simplex scale of 0.08. This four-variable continuous problem is a good fit for a derivative-free local search.

The real optimization reached the thicknesses in the table after 174 objective evaluations and 101 iterations. After selecting Apply to Structure, return to Structure and confirm that all four values were written back, then run a forward calculation with a finer 1 nm step. The optimization report samples every 5 nm, whereas final validation uses 1 nm, so their average values differ slightly.
Validate the Result
The optimized design has 0.0865% average reflectance over 450–650 nm, 0.00110% reflectance at 550 nm, and a band maximum of 0.5005% at 450 nm. The 400–700 nm average is 0.6508%; reflectance reaches 6.924% at 400 nm, demonstrating that the design does not promise performance beyond its optimization band.


The four design stages can now be compared with the same metrics.
| Design | Reflectance at 550 nm | Average reflectance, 450–650 nm |
|---|---|---|
| Bare glass | 4.258% | 4.258% |
| Single MgF₂ layer | 1.260% | 1.348% |
| Initial four-layer stack | 0.341% | 0.648% |
| Optimized four-layer stack | 0.00110% | 0.0865% |
All four lossless structures satisfy , with a maximum numerical conservation error of about . Here, is power transmittance. This check can expose missing absorption, incorrect boundaries, or result-reading errors, but it does not prove that the material model accurately represents a real sample.
Common Errors and Recovery Order
| Symptom | Likely cause | Action |
|---|---|---|
| No reflectance minimum near 550 nm | Incorrect quarter-wave thickness or layer order | Recalculate , then check the stack from the air side |
| Dense fringes across the spectrum | The millimeter glass substrate is coherent | Mark the glass substrate as incoherent |
| Excellent performance at only one point | A single wavelength was used instead of a band average | Use average reflectance over 450–650 nm as the objective |
| An optimized value touches a bound | The search range limits the improving direction | Check manufacturability, then widen that variable's bound if appropriate |
For an engineering design, replace the constant indices with process-specific n and k spectra, then repeat angle, polarization, thickness-error, and dispersion checks.
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